In 1960, I have inaugurated the industrial cleaning for the first time in Japan. Thereafter, cleaning has been made for the working clothes and jigs or tools as well as the filters in heavy industries, heavy electric companies, electronics, pharmaceutical and food- industries.Industrial cleaning has already been applied in 1940s in the USA and the cleaning was made mainly for the production control of the secondary products.
After the second world war, President J. F. Kennedy proposed Apolo Project in 1962, thereafter, high-precision industries have been rapidly developed in the advanced countries, and its research and development has become an important theme. In western countries including Japan,semiconductor industry shows rapid development, and our researches have been advanced in parallel to the development of those industries.
In June, 1976, Nippon CIC Laboratory has established the First CIC Plant. Since then, we have been cooperating with the industries as helpers for maintenance control of clean- room for manufacture of LSI-VLSI in the field of electronics and also as helpers for adaptation to the standards of FDA and GMP on the manufacturing line in pharmaceutical and food industries.
Our cleaning services meet your Surface Contamination Control requirements which required by the most rigid standards of semiconductor manufacturing cleanroom. Nippon CIC Laboratory has been a pioneer in this area and we have our own Surface Cleanlinese Measuring System which can privide the information for both particulate and chemical contamination.
We also privide clean packing material products including CPE BAG, SCC BAG and BSC BAG.
